Microcrystalline Silicon Solar Cells at Higher Deposition Rates by the VHF-GD
نویسندگان
چکیده
منابع مشابه
Amorphous solar cells, the micromorph concept and the role of VHF-GD deposition technique
During the last two decades, the Institute of Microtechnology (IMT) has contributed in two important fields to future thin-film silicon solar cell processing and design: (1) In 1987, IMT introduced the so-called ‘‘very high frequency glow discharge (VHF-GD)’’ technique, a method that leads to a considerable enhancement in the deposition rate of amorphous and microcrystalline silicon layers. As ...
متن کاملFast Deposited Microcrystalline Silicon Solar Cells
Microcrystalline silicon solar cells with AM 1.5 conversion efficiency above 5 % have been deposited at deposition rates in excess of 10 Å/s. This is achieved by VHF-GD at an excitation frequency of 130 MHz. By increasing the plasma power at a dilution ratio of 7.5 % silane/(silane+hydrogen) there first appears a morphological transition from a-Si:H to μc-Si:H and then an increase in deposition...
متن کاملFrom amorphous to microcrystalline silicon films prepared by ž / hydrogen dilution using the VHF 70 MHz GD technique
The amorphous and microcrystalline silicon films have been prepared by hydrogen dilution from pure silane to silane concentrations G1.25%. At silane concentrations of less than 10%, a transition from the amorphous phase to the microcrystalline phase can be observed. X-ray diffraction spectroscopy indicates a preferential growth of the crystallites in w x the 220 direction. Additionally, the tra...
متن کاملScope of Vhf Plasma Deposition for Thin-film Silicon Solar Cells
The world-wide attempts in obtaining thin-film crystalline silicon are reviewed. Based on literature published sofar, it appears that high-temperature manufacturing steps seem to be unavoidable for obtaining high conversion efficiencies of crystalline silicon based solar cells. High process temperatures are in contradiction for the use of low-cost substrates like e.g. glass or aluminium. Such s...
متن کاملIntermittent Very High Frequency Plasma Deposition on Microcrystalline Silicon Solar Cells Enabling High Conversion Efficiency
Stopping the plasma-enhanced chemical vapor deposition (PECVD) once and maintaining the film in a vacuum for 30 s were performed. This was done several times during the formation of a film of i-layer microcrystalline silicon (μc-Si:H) used in thin-film silicon tandem solar cells. This process aimed to reduce defect regions which occur due to collision with neighboring grains as the film becomes...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: MRS Proceedings
سال: 1996
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-452-883